Nickel Target Material
Nickel target material is an important functional material widely used in fields such as semiconductors, display panels, solar cells, etc. Its production process is complex, with key technologies including material smelting, forming, and welding processes to ensure high purity and excellent performance of the final product.
Description
Shaanxi Zhongheng Weichuang Metal Materials Co., Ltd. supplies high-quality rare metals, mainly engaged in conventional processing profiles such as niobium hafnium alloy 103, tantalum, niobium, hafnium, titanium, zirconium, nickel, vanadium, and their alloys, as well as deep processing products such as boats, crucibles, sputtering targets, coating targets, machined parts, high-temperature furnace insulation screens, heating elements, furnace bodies (heating furnaces, annealing furnaces), and corrosion-resistant equipment. Our main product purity can reach up to 99.95% -99.99%, with "worry free quality and better price"! Customer service is always online, making you worry free and at ease.
product key technologies
core features
High purity and stability
The purity of nickel target material is usually ≥ 99.90% (Ni99.90), with extremely low impurity content (sulfur and phosphorus ≤ 0.015%), ensuring stable performance in high temperature and strong corrosive environments.
Excellent physical performance
High density (9.2g/cm ³), high melting point (1330-1350 ℃), strong high-temperature creep resistance;
Good ductility and ferromagnetism, surface anti-oxidation after polishing.
Functional advantages
Suitable for magnetron sputtering coating, forming uniform thin films, improving conductivity, wear resistance, and corrosion resistance.
Key technologies in production process
Raw material purification and melting
Electrolytic purification: removing impurities such as iron and copper, with a purity of over 99.90%;
Vacuum melting: Melting under inert gas protection (temperature 50-150 ℃ above melting point) to reduce oxidation.
Forming and processing
Hot/Cold Rolling: Hot rolling temperature 800-1000 ℃ (deformation 30% -50%), cold rolling deformation 10% -30%, refine grain size;
Annealing treatment: Keep at 600-800 ℃ for 2-4 hours to eliminate internal stress.
Surface treatment and testing
Precision machining ensures dimensional accuracy, with surface roughness Ra ≤ 0.1 μ m;
Chemical composition analysis and mechanical property testing ensure quality.
Core application areas
Semiconductor and Electronics Industry
Integrated circuit thin films and magnetic storage devices (such as hard disk heads) play a role in conductivity and diffusion barriers;
Electrodes for flat panel displays and conductive layers for LED devices.
In the field of new energy
Conductive layer of solar cells to enhance photoelectric conversion efficiency;
Fuel cell electrode materials.
High end equipment manufacturing
Aerospace high-temperature components (engine components), corrosion-resistant components for nuclear power plants;
Medical device coating (biocompatibility requirements).
Functional coating
Optical lens anti reflection film, low radiation coating for architectural glass;
Wear resistant coating and decorative coating for tools (such as clock jewelry).
Nickel target material, as a high-performance material, exhibits excellent advantages in high purity, stability, and physical properties.
Its high purity (≥ 99.90%) and low impurity content (sulfur, phosphorus ≤ 0.015%) ensure stable performance in high temperature and strong corrosive environments, while its high density, high melting point, excellent ductility, and ferromagnetism further expand its application range.
In terms of functionality, nickel target materials are suitable for magnetron sputtering coating technology, which can form uniform thin films and significantly improve the conductivity, wear resistance, and corrosion resistance of materials, making them widely applicable in fields such as electronics, optics, automotive, and aerospace.
With the continuous advancement of technology and the diversification of market demand, the application fields of nickel target materials will be further expanded, and their value in high-performance thin film preparation and precision manufacturing will also continue to increase.
In the future, nickel target materials will continue to drive technological development in related industries, injecting new vitality into materials science and industrial applications.
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